Consumables

TEKNEK TO UNVEIL LATEST WEB CLEANING RESEARCH AT AIMCAL CONFERENCE 2013

Wednesday 14. August 2013 - Teknek will reveal the latest research into web cleaning technology at the AIMCAL (Association of International Metallizers, Coaters and Laminators) 2013 Conference which takes place in Charleston, South Carolina (October 27-30).

Sheila Hamilton, Teknek’s technical director, has been invited to speak at the conference on the subject of “Substrate Cleaning in a High Vacuum Environment”. The deposition of very thin functional films within a vacuum chamber is particularly susceptible to particulate contamination on the substrate. Teknek has developed a new contact cleaning system that can operate within a high vacuum environment without detriment to either the vacuum chamber operation or to the cleaning performance of the unit.
The paper will present the results of work carried out together with the Holst Centre in the Netherlands under the auspices of the European Community funded programme “Clean4Yield”1 .
Sheila Hamilton said: “Results presented will include details of outgassing tests conducted on various different contact cleaning elastomers and adhesives within a high vacuum chamber together with details of the cleaning performances of the elastomer both before and after vacuum exposure. The best performing elastomer and adhesive were then incorporated into a special cleaning unit, designed specifically to operate at the unwind and rewind stations of a silicon nitride deposition tool for barrier film.”
Ruaridh Nicolson, Teknek’s sales and marketing manager commented: “Over the past 18 months we have presented at no fewer than 14 high-level industry events with many more to follow in future. I believe this recognises Teknek’s long-standing commitment to research and the application of science which keeps us at the forefront of contact cleaning technology.”