GEW at InPrint 2017 in Munich
Thursday 23. November 2017 - At InPrint 2017 in Munich GEW will display its proven range of arc lamp and LED UV curing systems for printing and coating applications available in widths from 10cm up to 2.5m from a single lamp. GEW UV systems are robust, versatile systems widely used for applications in the inkjet and industrial printing industries.
GEW’s patented LED UV curing solutions are specifically designed with demanding industrial applications in mind. They are the most powerful LED UV curing designs of their kind. Special consideration was given to the advanced cooling design to ensure effective heat dissipation at high power levels of up to 27 W/cm2 depending on wavelength. GEW’s LW2 system boasts uniform UV output and wavelength across the full curing width and enjoys the benefits of GEW’s quality build with outstanding reliability, long-term consistent output and extended life cycles.
GEW’s patented NUVA2 arc lamp UV system is engineered for efficiency and lowest maintenance. Active air-cooling and optically tuned reflectors maximise the lamps’ curing effect while at the same time reducing heat radiation onto the substrate. In any UV curing installation the NUVA2 and the associated RHINO power supply achieve accelerated production speeds, increased uptime and energy savings of up to 50%, backed up with the security of a 5-year warranty unique in the industry.